Atomic layer etching (ALE) is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical modification...

Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical...

conductivity) Etching (microfabrication) Dry etching (plasma etching) Reactive-ion etching (RIE) Deep reactive-ion etching (DRIE) Atomic layer etching (ALE) Plasma...

aspect ratio structures. The company uses reactive ion etch (RIE) and atomic layer etching (ALE) to shape a variety of conductive and dielectric features. The...

Asymptotically locally Euclidean, a division of gravitational instanton Atomic layer etching, a technique in semiconductor device fabrication Automatic link establishment...

Joseph, Eric A.; Oehrlein, Gottlieb S. (2014). "Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma". Journal of Vacuum Science &...

sodium etching is defluorination of the PTFE, stripping the fluorine molecules from the carbon backbone of the polymer. The fluorine-to-carbon atomic ratio...

semiconductor manufacturers in fabrication plants for processes such as atomic layer deposition, epitaxy, chemical vapor deposition, and diffusion. The company...

MXenes prepared via HF etching have an accordion-like morphology, which can be referred to as multi-layer MXene (ML-MXene), or few-layer MXene (FL-MXene) given...

the basic techniques are deposition of material layers, patterning by photolithography and etching to produce the required shapes. Silicon Silicon is...

modification (e.g. by sputtering or ion beam etching) and for ion beam analysis. Ion beam application, etching, or sputtering, is a technique conceptually...

manner. Essentially, MLD resembles the well established technique of atomic layer deposition (ALD) but, whereas ALD is limited to exclusively inorganic...

fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism of etching through a thick steady state fluorocarbon layer Archived 2016-02-07...

prevention steps are applied. The oxide layer removal can be realized by various oxide etch chemistry methods. Dry etching processes, i.e. formic acid vapor...

deposition (MOCVD), wet wafer processing, molecular beam epitaxy (MBE), atomic layer deposition (ALD), physical vapor deposition (PVD), dicing and lapping...

composition across the surface, or in depth profiling when paired with ion-beam etching. It is often applied to study chemical processes in the materials in their...

bonding Reactive ion etching Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles...

ion etching (RIE). Other methods for forming a similar structure include electrochemical etching, stain etching, metal-assisted chemical etching, and...

source gas, liberated by evaporation or wet etching of the surface, may also diffuse into the epitaxial layer and cause autodoping. The concentration of...

to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques...

wafer processing steps from the creation of metal interconnect layers through the final etching step that creates pad openings (see also front end of line...

scientist known for her research developing advanced atomic layer deposition (ALD) and etching techniques. Her research focuses on creating thin films...

clean silicon. To remove existing native oxide layers wet chemical etching (HF clean), dry chemical etching or chemical vapor deposition (CVD) with different...

surface. Photolithography and etching removes some polymer layers to uncover conductive pads on the ICs. Afterwards, the anode layer is applied to the device...

cross-linking (dominating in the track halo). Low atomic mobility: For selective ion track etching, the density contrast between the latent ion track...

This method differs from regular etching as two layers are placed on the surface to be grooved, but only the upper layer is exposed to the etchant, leaving...

single atoms yields specific atomic configuration at the probe tip, which yields very high resolution. Electrochemical etching is one of the most widely...

few-layer boron nitride sheets have a strength similar to that of monolayer boron nitride. Thermal conductivity. The thermal conductivity of atomically thin...

microscopy. Atomic force microscope tips can be used as a nanoscale "write head" to deposit a resist, which is then followed by an etching process to remove...

electron beam. Etching must be done only in the absorbing layer and thus there is a need to distinguish between the capping and the absorbing layer, which is...