Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate...

etchants are liquid-phase ("wet") and plasma-phase ("dry"). Each of these exists in several varieties. The first etching processes used liquid-phase ("wet")...

strength. The primary methods currently used in industry are sodium etching and plasma etching. Results of ion beam treatment and laser surface roughening have...

wet etching, and use plasma etching instead. Plasma etchers can operate in several modes by adjusting the parameters of the plasma. Ordinary plasma etching...

response of plasma to electromagnetic fields is used in many modern devices and technologies, such as plasma televisions or plasma etching. Depending on...

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE...

techniques include: Plasma activation Plasma ashing Plasma cleaning Plasma electrolytic oxidation Plasma etching Plasma functionalization Plasma polymerization...

residues by oxygen plasmas is sometimes correctly described as a dry etch process. The term plasma ashing can be used instead. Dry etching is particularly...

thin metal films onto semiconductors. Tetrafluoromethane, is used for plasma etching in semiconductor manufacturing, flat panel display production, and...

sputtering, plasma-enhanced chemical vapor deposition (PECVD)) and etching. Inductively coupled plasma Multipactor effect Plasma etching UK Wireless Telegraphy...

representing the available ionic species. Plasma etching Plasma Processing: Proceedings of the Symposium on Plasma Processing. Electrochemical Society. 1987...

three categories: Plasma etching systems (RIE, ICP, DRIE) Plasma deposition systems (PECVD and LS-CVD®) Surface treatment systems (plasma cleaners, UV-Ozone...

used today is called plasma etching. Plasma etching usually involves an etch gas pumped in a low-pressure chamber to create plasma. A common etch gas is...

was while he was at Hewlett Packard that he saw the need for better plasma etching equipment, to keep up with the rapid miniaturization of semiconductor...

each net is disconnected from the initial global metal layer, and the plasma etching is still adding charges to each piece of metal. Leaky gate oxides, although...

Marshall's acid (H2S2O8) Peroxymonosulfuric acid, or Caro's acid (H2SO5) Plasma etching RCA clean (silicon wafer cleaning procedure) Superhydrophilicity Ultrahydrophobicity...

from MIT, Lam worked on plasma etching research and engineering at Texas Instruments and Hewlett-Packard. Although plasma etching was widely used in R&D...

easily by oxygen, fluorine, chlorine and other reactive gases used in plasma etching. Use of a hardmask involves an additional deposition process, and hence...

desired shape. Other names for chemical etching include photo etching, chemical etching, photo chemical etching and photochemical machining. It is mostly...

coupled plasma Induction plasma technology Pulsed inductive thruster High density fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism...

both make use of helicons in their plasma heating phase). Helicons are also utilized in the procedure of plasma etching, used in the manufacture of computer...

Dry etching (plasma etching) Reactive-ion etching (RIE) Deep reactive-ion etching (DRIE) Atomic layer etching (ALE) Plasma ALE Thermal ALE Wet etching Buffered...

removed. Etching techniques include: Dry etching (plasma etching) such as reactive-ion etching (RIE) or deep reactive-ion etching (DRIE) Wet etching or chemical...

in liquid-, gas- or plasma-phase, although liquid etchants such as buffered hydrofluoric acid (BHF) for silicon dioxide etching are more often used....

durable protecting layer in future ion implantation, wet chemical etching, or plasma etching. From preparation until this step, the photolithography procedure...

through, this smear must be removed by a chemical de-smear process, or by Plasma etching. The de-smear process ensures that a good connection is made to the...

time-multiplexed etching, alternates repeatedly between two modes to achieve nearly vertical structures: A standard, nearly isotropic plasma etch. The plasma contains...

shareholder in the company. Naura has four business lines: Semiconductors (plasma etching, PVD, CVD, oxidation/diffusion, cleaning system, and annealing) Vacuum...

Research in Shanghai alleging infringement of trade secrets related to plasma etching equipment. In March 2017, the court sided in favour of AMEC but Lam...

usually carried out by chemical etching of the covering, laser cutting, laser evaporation of the covering, plasma etching or mechanical removal of the cover...