• Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical...
    65 KB (7,440 words) - 04:51, 17 February 2025
  • Essentially, MLD resembles the well established technique of atomic layer deposition (ALD) but, whereas ALD is limited to exclusively inorganic coatings...
    65 KB (8,538 words) - 12:35, 23 May 2025
  • Atomic layer epitaxy (ALE), more generally known as atomic layer deposition (ALD), is a specialized form of thin film growth (epitaxy) that typically...
    5 KB (568 words) - 18:07, 5 May 2021
  • Many growth methods rely on nucleation control such as atomic-layer epitaxy (atomic layer deposition). Nucleation can be modeled by characterizing surface...
    66 KB (8,526 words) - 13:29, 22 May 2025
  • Thumbnail for Chemical vapor deposition
    of. CVD is extremely useful in the process of atomic layer deposition at depositing extremely thin layers of material. A variety of applications for such...
    42 KB (5,024 words) - 16:41, 21 May 2025
  • (2014-12-01). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10–11–12): 332–344. doi:10...
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  • in fabrication plants for processes such as atomic layer deposition, epitaxy, chemical vapor deposition, and diffusion. The company was founded by Arthur...
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  • reactions underpinning the thin film deposition technique that years later became known as atomic layer deposition. He was the rector of Leningrad Technological...
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  • Thumbnail for Tuomo Suntola
    materials science, developing the thin film growth technique called atomic layer deposition. Suntola was born in Tampere, Pirkanmaa, in 1943, during the Continuation...
    10 KB (1,173 words) - 05:30, 11 October 2024
  • created using atomic layer deposition (ALD) with unique physical, chemical, and electronic properties. For example, a rough oxide layer can be further...
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  • etch and deposition, metal organic chemical vapor deposition (MOCVD), wet wafer processing, molecular beam epitaxy (MBE), atomic layer deposition (ALD),...
    19 KB (1,922 words) - 15:04, 26 August 2024
  • interest in diffraction patterns by differentiating by phase. In atomic layer deposition, the substrate acts as an initial surface on which reagents can...
    14 KB (1,609 words) - 06:33, 26 May 2025
  • trenches. The requisite layers, an anode, separator, and cathode, for a battery were then added by low-pressure chemical vapor deposition. The battery consists...
    23 KB (2,752 words) - 22:24, 11 February 2025
  • evaporation (e.g. CrBO3, β-BaB2O4), pulsed laser deposition (e.g. β-BaB2O4,  Eu(BO2)3), and atomic layer deposition (ALD). Growth by ALD was achieved using precursors...
    24 KB (2,658 words) - 16:15, 25 May 2025
  • Thumbnail for Aluminium oxide
    a thin film is a prerequisite and the preferred growth mode is atomic layer deposition, Al2O3 films can be prepared by the chemical exchange between trimethylaluminium...
    38 KB (3,774 words) - 05:15, 23 May 2025
  • Thumbnail for Pulsed laser deposition
    Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to...
    21 KB (2,603 words) - 02:05, 28 December 2024
  • Deposition can be viewed as a reverse process to dissolution or particle re-entrainment. Atomic layer deposition Chemical vapor deposition Deposition...
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  • be created using both synthetic and natural polymer materials. Atomic layer deposition (ALD) is a vapor-phase technique used to produce films with high...
    22 KB (2,357 words) - 00:06, 23 May 2025
  • Thumbnail for Semiconductor device fabrication
    (CVD) Metal organic chemical vapor deposition (MOCVD), used in LEDs Atomic layer deposition (ALD) Physical vapor deposition (PVD) Sputtering Evaporation Epitaxy...
    113 KB (11,784 words) - 00:35, 25 May 2025
  • Thumbnail for Optical rectenna
    University of Connecticut are using a technique called selective area atomic layer deposition that is capable of producing them reliably and at industrial scales...
    29 KB (3,668 words) - 03:32, 26 May 2025
  • required for transformation of a substance, or completion of the alchemical magnum opus. Atomic layer deposition Mond process Thermal decomposition v t e...
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  • Thumbnail for Nanotechnology
    focused ion beam machining, nanoimprint lithography, atomic layer deposition, and molecular vapor deposition, and further including molecular self-assembly...
    71 KB (7,194 words) - 18:10, 30 April 2025
  • Thumbnail for Perovskite solar cell
    TiO2 layer deposition be compatible with flexible polymer substrate, low-temperature techniques, such as atomic layer deposition, molecular layer deposition...
    200 KB (22,835 words) - 01:39, 23 May 2025
  • computers." The IEEE states: "Sandhu initiated the development of atomic layer deposition high-κ films for DRAM devices and helped drive cost-effective implementation...
    5 KB (406 words) - 03:43, 31 July 2024
  • Thumbnail for Lam Research
    electrochemical deposition (ECD) and chemical vapor deposition (CVD) technologies to form copper and other metal films for conducting structures. Atomic layer deposition...
    21 KB (2,013 words) - 11:59, 6 April 2025
  • Layer-by-layer (LbL) deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of complementary materials...
    9 KB (1,082 words) - 04:02, 17 March 2025
  • hafnium dioxide and zirconium dioxide, typically deposited using atomic layer deposition. It is expected that defect states in the high-κ dielectric can...
    12 KB (1,397 words) - 17:17, 4 September 2024
  • Assistive listening device used to improve hearing ability Atomic layer deposition, a thin-film deposition technique Asymmetric Laplace distribution, in probability...
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  • Thumbnail for Trimethylaluminium
    chemical vapor deposition or atomic layer deposition. The Al2O3 provides excellent surface passivation of p-doped silicon surfaces. The Al2O3 layer is typically...
    11 KB (920 words) - 14:10, 23 May 2025
  • Thumbnail for High-electron-mobility transistor
    (gallium nitride) metal–oxide–semiconductor HEMT (MOS-HEMT). It used atomic layer deposition (ALD) aluminum oxide (Al2O3) film both as a gate dielectric and...
    21 KB (2,569 words) - 20:00, 23 May 2025