Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions...
6 KB (678 words) - 05:26, 19 October 2023
MEMS (section Dry etching)
make electronics. These include molding and plating, wet etching (KOH, TMAH) and dry etching (RIE and DRIE), electrical discharge machining (EDM), and...
45 KB (5,603 words) - 20:43, 20 March 2025
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an...
16 KB (1,860 words) - 21:50, 23 May 2025
liquid-phase ("wet") and plasma-phase ("dry"). Each of these exists in several varieties. The first etching processes used liquid-phase ("wet") etchants...
17 KB (1,558 words) - 09:49, 28 May 2024
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE...
6 KB (724 words) - 01:55, 24 May 2025
Photolithography (section Etching, implantation)
installed side by side, and are "linked" together. In etching, a liquid ("wet") or plasma ("dry") chemical agent removes the uppermost layer of the substrate...
59 KB (6,439 words) - 19:14, 23 May 2025
conductivity) Etching (microfabrication) Dry etching (plasma etching) Reactive-ion etching (RIE) Deep reactive-ion etching (DRIE) Atomic layer etching (ALE) Plasma...
113 KB (11,784 words) - 00:35, 25 May 2025
Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio...
39 KB (5,196 words) - 14:06, 30 April 2025
thick film of the same material using electron beam lithography and dry etching in an oxygen plasma. The fibres were 2 μm long, with a diameter of around...
6 KB (730 words) - 10:48, 18 February 2025
Microfabrication (section Etching)
removed. Etching techniques include: Dry etching (plasma etching) such as reactive-ion etching (RIE) or deep reactive-ion etching (DRIE) Wet etching or chemical...
20 KB (2,111 words) - 03:31, 25 May 2025
cantilever structure to release it, often with an anisotropic wet or dry etching technique. Without cantilever transducers, atomic force microscopy would...
18 KB (2,151 words) - 14:49, 22 April 2025
Chemical milling (redirect from Industrial etching)
desired shape. Other names for chemical etching include photo etching, chemical etching, photo chemical etching and photochemical machining. It is mostly...
12 KB (1,532 words) - 00:36, 25 April 2025
principle behind chemical vapor deposition, physical vapor deposition, and dry etching which are essential to the fabrication of semiconductors and optical...
67 KB (7,592 words) - 18:05, 23 May 2025
deposition methods. They were originally patterned by wet etching, and later by various dry etching techniques. Initially, pure aluminum was used but by the...
11 KB (1,470 words) - 13:40, 3 January 2025
involving an acid, or a dry etch involving an ionized gas (or plasma). Dry etching can combine chemical etching with physical etching or ion bombardment....
5 KB (589 words) - 04:54, 27 June 2024
with electroplating (see also the so-called 'LIGA' process) and wet or dry etching. And they can be fabricated of various materials such as metal, silicon...
8 KB (1,193 words) - 17:34, 15 September 2019
lithography, dry etch, and atomic layer deposition (ALD). InGaN/GaN nanorod array light-emitting diodes can be manufactured with dry etching or focused...
16 KB (1,869 words) - 16:04, 23 May 2025
cavities over movable elements are possible using photolithography or dry etching. The hardening conditions depend on the materials used. Hardening of...
31 KB (3,822 words) - 16:57, 30 December 2024
etching and focused ion beam. In vertical slot-waveguides, the slot and strips widths are defined by electron- or photo-lithography and dry etching techniques...
20 KB (2,185 words) - 00:29, 23 May 2025
an appropriate solvent. Processing through the resist pattern: wet or dry etching, lift-off, doping... Resist Stripping Electron beam lithography Nanolithography...
5 KB (607 words) - 20:41, 16 May 2024
504–506. ISBN 9780750665261. Y. Tzeng, T.H. Lin (September 1987). "Dry Etching of Silicon Materials in SF 6 Based Plasmas" (PDF). Journal of the Electrochemical...
43 KB (4,163 words) - 19:24, 27 May 2025
thick film of the same material using electron beam lithography and dry etching in an oxygen plasma. The fibres were 2 μm long, with a diameter of around...
35 KB (4,224 words) - 01:13, 22 March 2025
Dry etching processes, i.e. formic acid vapor cleaning, are preferred based on the minimization of the immersion in fluids and the resulting etching of...
13 KB (1,465 words) - 09:17, 28 May 2024
complex etching process of structures. Vertical nanostructures are created in two steps. At first, needles in the silicon substrate are created by dry etching...
11 KB (1,245 words) - 20:05, 30 December 2024
Aquatint (redirect from Colour etching)
a variant of etching that produces areas of tone rather than lines. For this reason it has mostly been used in conjunction with etching, to give both...
19 KB (2,508 words) - 18:08, 12 May 2025
lithography and dry etching: lithographically formed layers of periodic grooves are stacked by regulated sputter deposition and etching, resulting in "stationary...
59 KB (6,985 words) - 23:28, 16 May 2025
since it is merely an unfunctionalized hydrocarbon. It is used in some dry etching masks and polymer formulations. In solid-state NMR spectroscopy, adamantane...
45 KB (4,343 words) - 13:33, 30 March 2025
Drypoint (redirect from Dry point engraving)
copper, but now acetate, zinc, or plexiglas are also commonly used. Like etching, drypoint is easier to master than engraving for an artist trained in drawing...
9 KB (1,290 words) - 06:07, 17 March 2025
on the micron scale. Wet chemical etching can be used to create layers of thickness 3 μm or larger, while dry etching techniques can be used to achieve...
17 KB (2,409 words) - 14:52, 4 January 2025
temperature Annealing (room temperature to 400 °C) The RIE mode is used in dry etching processes and through reduction of parameters, i.e. HF power, this method...
12 KB (1,401 words) - 19:44, 30 December 2024