Interference lithography (or holographic lithography) is a technique that uses coherent light (such as light from a laser) for patterning regular arrays...
11 KB (1,360 words) - 16:06, 5 January 2025
Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput...
33 KB (3,947 words) - 20:39, 9 June 2025
Lloyd's mirror (section Interference lithography)
to produce nanopatterned titanium implants by combining nanoimprint lithography and reactive ion etching" (PDF). 14th International Conference on Miniaturized...
11 KB (1,181 words) - 05:01, 9 June 2025
extreme precision, achieved through the technique of scanning beam interference lithography (SBIL). The director of the project, Mark L. Schattenburg, began...
10 KB (1,273 words) - 03:44, 27 May 2025
another Interference engine Interference fit, in engineering Interference lithography, in optics Thin-film interference, in optics Wave interference, in physics...
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Haidinger fringes Interference lithography Interference visibility Interferometer Lloyd's Mirror Moiré pattern Multipath interference Newton's rings Optical...
34 KB (4,646 words) - 08:54, 25 May 2025
1999, the MCC system was advanced for use in MEMS manufacturing. Interference lithography or holographic exposures are not maskless processes and therefore...
16 KB (1,995 words) - 15:31, 27 May 2025
Photolithography (redirect from Optical lithography)
Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer...
59 KB (6,439 words) - 21:11, 24 June 2025
interference lithography (LIL), electron beam lithography, and focused ion beam lithography. Several process are available using stencil lithography:...
6 KB (884 words) - 13:32, 5 March 2025
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits...
125 KB (14,643 words) - 00:20, 19 June 2025
Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes...
38 KB (4,736 words) - 02:29, 26 May 2025
printed by immersion lithography had reached zero level capability. As of 2000, Polarization effects due to high angles of interference in the photoresist...
10 KB (1,056 words) - 17:27, 24 May 2025
Microarray (section Lithography)
these reagent solutions identically. Lithography combines various methods like Photolithography, Interference lithography, laser writing, electron-beam and...
15 KB (1,691 words) - 21:08, 4 June 2025
Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask...
15 KB (1,938 words) - 19:39, 4 June 2025
3D microfabrication (section Multiphoton lithography)
fabricated using a lot of methods like two-photon photolithography, interference lithography and molding. But 3D structuring using these techniques is very...
14 KB (1,934 words) - 05:59, 24 May 2025
Claus-Michael; Bakowsky, Udo; Mücklich, Frank (2005-05-01). "Laser interference lithography as a new and efficient technique for micropatterning of biopolymer...
28 KB (3,290 words) - 19:48, 5 February 2025
Computational lithography (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution...
13 KB (1,502 words) - 20:40, 3 May 2025
FGS are interferometers) Holography Interferometric visibility Interference lithography List of types of interferometers Ramsey interferometry Seismic...
95 KB (10,986 words) - 18:50, 19 June 2025
sample. The principle of electron holography can also be applied to interference lithography. Acoustic holography enables sound maps of an object to be generated...
67 KB (8,023 words) - 19:20, 22 June 2025
Multiple patterning (category Lithography (microfabrication))
Vala; Jiri Homola (2014). "Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic...
70 KB (7,685 words) - 06:09, 6 June 2025
technologies such as evanescent near-field lithography, near-field interference lithography, and phase-shifting mask lithography were developed to overcome the diffraction...
97 KB (11,288 words) - 20:44, 22 May 2025
resonant underlayers and resonant overlayer designs for ultra-high NA interference lithography". JOSA A. 34 (12): 2243–2249. Bibcode:2017JOSAA..34.2243B. doi:10...
51 KB (6,963 words) - 00:24, 2 April 2025
Microlithography (category Lithography (microfabrication))
Electron beam lithography, using a steerable electron beam. Nanoimprinting Interference lithography Magnetolithography Scanning probe lithography Surface-charge...
3 KB (347 words) - 00:21, 6 January 2025
sample. The principle of electron holography can also be applied to interference lithography. Gabor, D. (1948). "A New Microscopic Principle". Nature. 161 (4098)...
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The Space Nanotechnology Laboratory performs research in interference lithography and diffraction grating fabrication. It has fabricated the high energy...
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Plasmonic nanolithography (redirect from Plasmonic lithography)
Plasmonic nanolithography (also known as plasmonic lithography or plasmonic photolithography) is a nanolithographic process that utilizes surface plasmon...
13 KB (1,223 words) - 11:11, 15 March 2025
techniques include electron beam lithography, nanostructuring with a focused ion beam and interference lithography. In 2014 a polarization-insensitive...
45 KB (4,386 words) - 09:50, 21 June 2025
photonic crystals and new fabrication techniques such as multi-beam interference lithography and colloidal self-assembly, complex fluids and soft condensed...
10 KB (927 words) - 01:10, 26 October 2024
Phase-shift mask (category Lithography (microfabrication))
Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography...
7 KB (805 words) - 13:59, 2 July 2023
Vol16, No9, 2008, p 6173 "Partially coherent extreme ultraviolet interference lithography for 16 nm patterning research" Applied Physics Letters Volume 93...
7 KB (655 words) - 22:45, 23 May 2025